JPH0551184B2 - - Google Patents
Info
- Publication number
- JPH0551184B2 JPH0551184B2 JP61053201A JP5320186A JPH0551184B2 JP H0551184 B2 JPH0551184 B2 JP H0551184B2 JP 61053201 A JP61053201 A JP 61053201A JP 5320186 A JP5320186 A JP 5320186A JP H0551184 B2 JPH0551184 B2 JP H0551184B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- emitter
- base region
- base
- emitter region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/16—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/133—Emitter regions of BJTs
Landscapes
- Semiconductor Memories (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61053201A JPS62210667A (ja) | 1986-03-11 | 1986-03-11 | 半導体記憶装置 |
EP87103318A EP0241699B1 (en) | 1986-03-11 | 1987-03-09 | Semiconductor memory device using junction short type programmable element |
DE8787103318T DE3771258D1 (de) | 1986-03-11 | 1987-03-09 | Halbleiter-speicheranordnung unter verwendung eines programmierbaren elementes vom uebergangs-kurzschluss-typ. |
US07/024,220 US4835590A (en) | 1986-03-11 | 1987-03-10 | Semiconductor memory device using junction short type programmable element |
KR8702173A KR900008668B1 (en) | 1986-03-11 | 1987-03-11 | Semiconductor memory device using uniplolar junction programmable element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61053201A JPS62210667A (ja) | 1986-03-11 | 1986-03-11 | 半導体記憶装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62210667A JPS62210667A (ja) | 1987-09-16 |
JPH0551184B2 true JPH0551184B2 (en]) | 1993-07-30 |
Family
ID=12936258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61053201A Granted JPS62210667A (ja) | 1986-03-11 | 1986-03-11 | 半導体記憶装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4835590A (en]) |
EP (1) | EP0241699B1 (en]) |
JP (1) | JPS62210667A (en]) |
KR (1) | KR900008668B1 (en]) |
DE (1) | DE3771258D1 (en]) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2569634B2 (ja) * | 1987-11-26 | 1997-01-08 | 日本電気株式会社 | 接合破壊型半導体記憶装置 |
JP2504553B2 (ja) * | 1989-01-09 | 1996-06-05 | 株式会社東芝 | バイポ―ラトランジスタを有する半導体装置の製造方法 |
US5198692A (en) * | 1989-01-09 | 1993-03-30 | Kabushiki Kaisha Toshiba | Semiconductor device including bipolar transistor with step impurity profile having low and high concentration emitter regions |
GB9007492D0 (en) * | 1990-04-03 | 1990-05-30 | Pilkington Micro Electronics | Semiconductor integrated circuit |
FR2663156A1 (fr) * | 1990-06-11 | 1991-12-13 | Sgs Thomson Microelectronics | Transistor bipolaire supportant des polarisations inverses et procede de fabrication. |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL162511C (nl) * | 1969-01-11 | 1980-05-16 | Philips Nv | Geintegreerde halfgeleiderschakeling met een laterale transistor en werkwijze voor het vervaardigen van de geintegreerde halfgeleiderschakeling. |
US4388703A (en) * | 1979-05-10 | 1983-06-14 | General Electric Company | Memory device |
JPS5953711B2 (ja) * | 1980-03-25 | 1984-12-26 | 日本電気株式会社 | メモリセル |
DE3029553A1 (de) * | 1980-08-04 | 1982-03-11 | Siemens AG, 1000 Berlin und 8000 München | Transistoranordnung mit hoher kollektor-emitter-durchbruchsspannung |
JPS60142559A (ja) * | 1983-12-29 | 1985-07-27 | Fujitsu Ltd | プログラマブル・リ−ド・オンリ・メモリ |
US4701780A (en) * | 1985-03-14 | 1987-10-20 | Harris Corporation | Integrated verticle NPN and vertical oxide fuse programmable memory cell |
US4748490A (en) * | 1985-08-01 | 1988-05-31 | Texas Instruments Incorporated | Deep polysilicon emitter antifuse memory cell |
-
1986
- 1986-03-11 JP JP61053201A patent/JPS62210667A/ja active Granted
-
1987
- 1987-03-09 EP EP87103318A patent/EP0241699B1/en not_active Expired
- 1987-03-09 DE DE8787103318T patent/DE3771258D1/de not_active Expired - Lifetime
- 1987-03-10 US US07/024,220 patent/US4835590A/en not_active Expired - Fee Related
- 1987-03-11 KR KR8702173A patent/KR900008668B1/ko not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0241699A3 (en) | 1988-09-21 |
DE3771258D1 (de) | 1991-08-14 |
US4835590A (en) | 1989-05-30 |
KR900008668B1 (en) | 1990-11-26 |
EP0241699A2 (en) | 1987-10-21 |
EP0241699B1 (en) | 1991-07-10 |
JPS62210667A (ja) | 1987-09-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4831424A (en) | Insulated gate semiconductor device with back-to-back diodes | |
US5034336A (en) | Method of producing insulated gate bipolar tranistor | |
US4323913A (en) | Integrated semiconductor circuit arrangement | |
EP0008903B1 (en) | Semiconductor integrated circuit device | |
JPH0551184B2 (en]) | ||
JPS6323335A (ja) | 半導体装置及びその製造方法 | |
JPS6048111B2 (ja) | 不揮発性半導体記憶装置 | |
JP2508826B2 (ja) | 半導体装置 | |
JPS60170251A (ja) | 半導体装置の製造方法 | |
JP2760401B2 (ja) | 誘電体分離基板及び半導体装置 | |
KR19990010738A (ko) | 전력용 반도체소자 및 그 제조방법 | |
JPS63119255A (ja) | 低ド−ズエミッタ垂直フュ−ズ | |
JPS62128172A (ja) | 接合短絡型プログラマブルリ−ドオンリメモリ | |
JPS59198768A (ja) | ツエナ−ダイオ−ド | |
JPH01112779A (ja) | 定電圧ダイオード及びその製造方法 | |
JPH0277173A (ja) | トランジスタ | |
JPS59161067A (ja) | バイポ−ラ型半導体装置の製造方法 | |
JPS59165454A (ja) | ラテラル型半導体装置 | |
JPS58107645A (ja) | 半導体装置の製法 | |
JPS5910270A (ja) | 半導体集積回路装置 | |
JPH0243337B2 (en]) | ||
JPS6118867B2 (en]) | ||
JPS61164260A (ja) | バイポ―ラトランジスタ | |
JPH01189173A (ja) | 半導体装置 | |
JPH0715940B2 (ja) | 半導体装置の製造方法 |